Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect

by Jie Cheng

Book Overview

This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. Pursuing a systematic approach to resolve the remaining critical issues in the CMP, it first investigates the tribocorrosion properties and the material removal mechanisms of copper (Cu) and Ru in KIO4-based slurry. The thesis subsequently studies Cu/Ru galvanic corrosion...

• Format: Paperback
• Language: English
• ISBN: 9811355851
• ISBN13: 9789811355851
• Release Date: January 2019
• Publisher: Springer
• Length: 137 Pages
• Weight: 0.50 lbs.
• Dimensions: 0.3" x 6.1" x 9.2"