Pulsed and Pulsed Bias Sputtering: Principles and Applications

by Edward V. Barnat and Toh-Ming Lu

Book Overview

Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing of integrated... This description may be from another edition of this product.

• Format: Paperback
• Language: English
• ISBN: 1461350638
• ISBN13: 9781461350637
• Release Date: February 2014
• Publisher: Springer
• Length: 157 Pages
• Weight: 0.55 lbs.
• Dimensions: 0.4" x 6.1" x 9.2"