Plasma Processes for Semiconductor Fabrication

by W.N.G. Hitchon

Book Overview

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then...

• Format: Paperback
• Language: English
• ISBN: 0521018005
• ISBN13: 9780521018005
• Release Date: September 2005
• Publisher: Cambridge University Press
• Length: 232 Pages
• Weight: 0.90 lbs.
• Dimensions: 0.5" x 7.0" x 10.0"

Customer Reviews

Excellent resource for plasma physics

This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.