Photomask Fabrication Technology

by Benjamin G. Eynon and Banqiu Wu

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Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical...

• Format: Hardcover
• Language: English
• ISBN: 0071445633
• ISBN13: 9780071445634
• Release Date: August 2005
• Publisher: McGraw-Hill Companies
• Length: 500 Pages
• Weight: 2.03 lbs.
• Dimensions: 1.8" x 6.2" x 9.3"