Mark Tobey and Teng Baiye: Seattle / Shanghai

By Debra J. Byrne, Teng Hiok Chiu, Kazimierz Z. Posnanaski

Book Overview

Mark Tobey and Teng Baiye: Seattle / Shanghai is the first book to explore artistic and intellectual exchanges between Chinese artist Teng Baiye (1900-1980) and his American contemporary Mark Tobey (1890-1976). Essays by Jo-Anne Birnie Danzker and David Clarke consider Teng's influence as both a cultural interpreter and an artistic practitioner on the development of Tobey's distinctive artistic practice and -- through Tobey -- on the discourse on abstraction in midcentury American art.

• Format: Hardcover
• Language: English
• ISBN: 0962460265
• ISBN13: 9780962460265
• Release Date: July 2014
• Publisher: Frye Art Museum
• Length: 80 Pages
• Weight: 1.90 lbs.
• Dimensions: 0.5" x 10.4" x 11.4"
• Grade Range: Postsecondary and higher