Machine Learning-Based Modelling in Atomic Layer Deposition Processes

by Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

• Format: Hardcover
• Language: English
• ISBN: 1032386703
• ISBN13: 9781032386706
• Release Date: December 2023
• Publisher: CRC Press
• Length: 354 Pages
• Weight: 1.55 lbs.
• Dimensions: 0.9" x 6.1" x 9.2"