Glow Discharge Processes: Sputtering and Plasma Etching

by Brian Chapman

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the...

• Format: Hardcover
• Language: English
• ISBN: 047107828X
• ISBN13: 9780471078289
• Release Date: September 1980
• Publisher: Wiley-Interscience
• Length: 432 Pages
• Weight: 1.80 lbs.
• Dimensions: 1.2" x 6.2" x 9.7"

Customer Reviews

Great fundamental reference

While the specifics of various systems is dated, this is a great reference for the basics of plasma processing. Even though the equipment I use today is significantly more advanced I continually refer to this work for baseline information. The explanations are clear and well written. A rare example of a reference / textbook one can actually read.

Good introductory book, too expensive

This is the ideal book for beginning students attempting to navigate the maze of plasma physics for the first time. The book concentrates on developing an intuitive feel for ionized gases while including enough real physics to back up the intuition with numbers. It's unfortunate that the publisher has priced this work out of the range of the average student for whom it would be so useful.