Chemical Vapour Deposition: Growth processes on an atomic level

by Karin Larsson

This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results.

• Format: Hardcover
• Language: English
• ISBN: 0750331054
• ISBN13: 9780750331050
• Release Date: January 2023
• Publisher: Institute of Physics Publishing
• Length: 400 Pages
• Weight: 2.06 lbs.
• Dimensions: 0.9" x 7.0" x 10.0"